Lecturer: Dr. Yifang Chen,
Science and Technology Facilities Council, UK
Dr. Yifang Chen is a Principle Scientist at the Rutherford Appleton Laboratory (RAL) of UK, specialized in lithography based nanotechnology (electron beam lithography, nanoimprint lithography, hot embossing and reactive ion etching and nanofabrications, etc.) for 20 years. He has been recognised as one of the leading experts in this area. He is currently working on technical development of nanotechnology and its applications for nanoelectronics (including nanospintronics), nanophotonics, metamaterials and nano bioscience, by leading a number of large research projects including UK EPSRC BT project, UK TSB project and EU projects.
Format: 1 day
Tutorial Fees (coffee breaks and lunch at the Marriott included):
- For conference registrants:
* Regular participants: 110 EUR
* Students: 80 EUR
- For non conference registrants:
* Regular participants: 240 EUR
* Students: 190 EUR
Tutorial outline and description:
The scope of the tutorial course will be in the regime of lithography based top-down nanofabrication techniques for nanophotonics and metamaterials with high order of periodicity and symmetry. The course will first emphasize the vital correlation between science and technology: the advance of science is based on the development of technique that is driven by the progress in science. The course will first establish the basic concept of Nanofabrication techniques: definition, categories, development history, current status, discussion of future directions, and its broad applications in almost every discipline in science and technology.
The main part of the course will cover the most frequently applied lithography techniques: electron beam lithography (EBL), Nano imprint lithography (NIL), hot embossing, reactive ion etch (RIE) and micro/nanofabrication processes. For each lithography technique including RIE, the basic principle of lithography will first be reviewed. Then specific cases will be used to demonstrate the fabrications of various nanophotonic structures and metamaterials. Based on this know-how level, this course will try to convince you that nanofabrication is not just to use powerful tools for replicating nanostructures.
The course will deliver to you practical experiences in designing process, solving problems, playing tricks for achieving various structures which cannot be simply generated by employing lithography tools. In the last part of the course, recently emerging techniques such as holographic lithography, focus ion beam, near field lithography and other lithography techniques will be briefly described.
Benefits and learning objectives:
1. Knowledge transfer in state-of-art nanolithography to support scientific research as a whole.
2. Understanding in principle depth of nanofabrications to match the scientific research.
3. Sharing practical experiences and technical tricks in micro and nanoprocessing for problem solving.
4. Training to young scientists/technologists and graduate students in micro and nanofabrications including electron beam lithography, nanoimprint lithography, micro and nanofabrications for various small structures.
Intended audience:
Young scientists, lithographers, technologists, graduate students and processing engineers.
Prerequisites:
There will be a clinical session with all attendees interacting with each other to discuss and find solutions to any practical problems and structures to be fabricated in real life. Attendees are encouraged to present practical cases of nanostructures for fabrication, which are thought to be very difficult to be made. It is suggested that the descriptions of the cases should be sent to the instructors well before the tutorial course to allow the instructors have plenty of time in preparation, although interactive discussion will be carried out in the clinical session.
Registration:
Please complete this form
and email it with the copy of the wire transfer receipt to the Conference Secretariat: meta10@lgep.supelec.fr
© META10 · Updated October 1st, 2009 by
Saïd Zouhdi
